Oh K! Detoxifying Peel Off Clay Mask

A super satisfying and easy to peel off mask to help remove impurities and reduce the appearance of pores. Formulated with Kaolin Clay to gently exfoliate and lift away impurities and Witch Hazel to help control excess sebum production. Use up to three times a week after cleansing for a pore perfecting treat.

Key Ingredients & Benefits

• Witch Hazel Extract (Hamamelis Virginiana) - helps to control sebum production.
• Kaolin Clay - draws out impurities.

How to Use

Spread a thin layer of the mask over the whole face or target specific problem areas, avoiding hair, eye and lip area. Allow to dry for 20 minutes. Peel off gently and rinse away any excess.

Full Ingredients List

Ingredients: Aqua (Water, Eau), Alcohol Denat., Polyvinyl Alcohol, Kaolin, Glycerin, Butylene Glycol, Caprylic/Capric Triglyceride, 1,2-Hexanediol, Magnesium Aluminum Silicate, Cetyl Ethylhexanoate, CI 77891 (Titanium Dioxide), Xanthan Gum, Sorbitan Sesquioleate, Polysorbate 80,  Allantoin, Glyceryl Acrylate/Acrylic Acid Copolymer, PVM/MA Copolymer, Hamamelis Virginiana (Witch Hazel) Water, Sodium Acetate, Ethylhexylglycerin.

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Want to see Oh K! IRL? Find Oh K! online and in-stores at these retailers.